Materials Science Division

Research Interest Statement

Within materials research, complex oxide thin films comprise an area of consistently strong research activity. This attention originates from the fact oxides, like perovskites, posses a strong interplay between charge, spin, strain and chemistry. The available parameter space is expanded in thin film form with the realization of designed interfaces, surfaces, superlattices, and domain structures, on both the atomic and meso-scale. My interests include synthesis of complex oxide thin films and nanostructures. Furthermore, I am interested in connecting functional properties (e.g., switchable conductivity, superconductivity, piezoelectricity/ ferroelectricity, and catalytic reactivity) to the detailed structure using scanning probe microscopy techniques and synchrotron X-ray sources.

Selected Publications

• “Modular instrument mounting system for variable environment in-operando X-ray experiments.” C.M. Folkman, M.J. Highland, E. Perret, S.K. Kim, T.T. Fister, H. Zhou, P.M. Baldo, S. Seifert, J.A. Eastman, P.H. Fuoss, D.D. Fong. Review of Scientific Instruments. (submitted Dec. 2012)
• “X-ray nanodiffraction of tilted domains in a poled epitaxial BiFeO3 thin film.” S.O. Hruszkewycz, C.M. Folkman, M.J. Highland, M.V. Holt, S.H. Baek, S.K. Streiffer, P. Baldo, C.B. Eom, P.H. Fuoss. Applied Physics Letters. 99 (2011) 232903
• “Twin wall distortions through structural investigation of epitaxial BiFeO3 thin films.” C.M. Folkman, S.H. Baek, C.B. Eom. Journal of Materials Research. 26 (2011) 2844
• “Giant piezoelectricity on Si for hyperactive MEMS.” S.H. Baek, J. Park, D.M. Kim, V.A. Aksyuk, R.R. Das, S.D. Bu, D.A. Felker, J. Lettieri, V. Vaithyanathan, S.S.N. Bharadwaja, N. Bassiri-Gharb, Y.B. Chen, H.P. Sun, C.M. Folkman, H.W. Jang, D.J. Kreft, S.K. Streiffer, R. Ramesh, X.Q. Pan, S. Trolier-Mckinstry, D.G. Schlom, M.S. Rzchowski, R.H. Blick, C.B. Eom. Science. 334 (2011) 958
• “Domain dynamics during ferroelectric switching.” C.T. Nelson, P. Gao, J.R. Jokisaari, C. Heikes, C. Adamo, A. Melville, S.H. Baek, C.M. Folkman, B. Winchester, Y.J. Gu, Y.M. Liu, K. Zhang, E.G. Wang, J.Y. Li, L.Q. Chen, C.B. Eom, D.G. Schlom, X.Q. Pan. Science. 334 (2011) 968

Patents:

• #110203-US-01. A novel thin film deposition system to fabricate epitaxial multilayers with in-situ RHEED capabilities for fast switching sputtering and PLD sources. Non-exclusive license agreement with Intel Corporation ©.