Nanoscale Studies of Metal/Oxide/Metal Tunnel Junction Structures: Development of Novel Characterization Tools
Nanoscale
Studies of Metal/Oxide/Metal Tunnel Junction Structures: Development of
Novel
Characterization Tools
Scientific
Achievement
We
have developed a novel technique for in-situ TEM characterization of
the local
transport properties of multilayer thin films, including new sample
preparation
methodologies for fabricating suitable TEM samples from sheet wafers.
This
method represents a significant development in the field of in-situ TEM
experiments, as it is the first time that local nanometer-scale
transport
properties of multilayer thin films can be correlated directly to the
microstructure at the actual measurement site, enabling the role of the
interfaces to be determined. We have successfully demonstrated the
ability to
obtain in-situ 4-point DC measurements of the I-V characteristics of
magnetic
tunnel junctions (MTJs) using a point-contact (diameter down to ~40 nm)
whilst
simultaneously imaging the local tunneling site at high magnification.
As an
example, we applied this technique to as-grown and annealed
CoFe/MgO/CoFe MTJs:
the I-V curves for the as-grown specimen are asymmetric with respect to
voltage, and a layer of mixed Fe,Co oxide at the bottom interface is
responsible for this effect. On annealing at 340 °C for 1 hour in high
vacuum,
the conductance across the specimens becomes more symmetric with
respect to
voltage: diffusion of the ferromagnetic elements into the barrier makes
it more
homogeneous.
Significance
This
work is a
significant development in the fundamental understanding of
microstructure/magnetotransport correlations in multilayer films. It
represents
the first time that transport behavior is correlated with directly
interpretable high-resolution images from the exact measurement site.
We have
first demonstrated this technique on model MTJs, which represent an
active area
of fundamental scientific research. Although MTJs are commercially used
in hard
disk drive read heads and solid state memory, little is actually known
of their
fundamental properties, particularly the contribution of the
interfaces. This
is reflected in the fact that the performance of the best MTJs reach
only 50%
of that predicted by theory. This work is a significant step forward in
the
study of the fundamental science of these structures. Portions of this
work
have been published in Annu. Rev. Mater.
Res. 38, 559 (2008) (one of the top 10
downloaded papers from ARMR
in 2008); Ultramicrosc. 108,
1529 (2008); Appl. Phys. Lett. 93,
103113 (2008).
We
are extending our studies to novel MTJs materials such as for example
those
containing 100% spin polarized materials, as well as to other relevant
structures that would benefit from in-situ structure-transport
correlation.
These will include complex perovskite and related oxides for resistive
memory
applications as well as ferroelectric and multiferroic multilayers for
use in
nanocapacitors, switches, and sensors.
Performers
A. N.
Chiaramonti, A. K. Petford-Long, L. J. Thompson, Y. Liu
(Argonne-MSD); D. K. Schreiber (Argonne-MSD, Northwestern U.); W. F.
Egelhoff
(NIST, Gaithersburg), D. N. Seidman (Northwestern U.), H.-S. Yang (IBM;
National U. Singapore), Y-S. Choi, D. D. Djayaprawira (Canon-Anelva
Corp.)

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