Fabrication of Scanning Electrochemical – Atomic Force Microscopy Probes by Atomic Layer Deposition of Aluminum Oxide
Fabrication
of Scanning Electrochemical – Atomic Force
Microscopy Probes by Atomic Layer Deposition of Aluminum Oxide
Scientific
Achievement
This work focused on the
development of scanning
electrochemical–atomic force microscopy (SECM-AFM) probe fabrication
procedures. SECM-AFM
probes consist of
an exposed nanoelectrode integrated into the apex of a conventional AFM
probe,
allowing for simultaneous imaging of surface topography and
electrochemical or
biological activity. The
primary
fabrication obstacle is the localized removal of an insulating film at
the
probe apex to expose the nanoelecrode.
Dual-beam focused ion beam (FIB) milling is used for this
process, as it
provides for high resolution removal of the insulating film.
Initial attempts focused on
conductive AFM probes coated
with 50 nm of Al2O3.
FIB milling is used to remove the Al2O3
film at
the apex and expose the underlying conductive film as the nanoelectrode. However, successful probe
fabrication by this
procedure is limited by imprecise milling.
For example, if insufficient Al2O3
is removed, the
conductive film is not exposed.
Conversely, if excessive material is removed, the probe
becomes
unnecessarily blunt and exhibits limited spatial resolution.
To address this issue, a
nanopillar probe geometry was
pursued. Utilizing
the electron-beam
induced deposition (EBID) capabilities of the dual-beam FIB, a 60 nm
diameter
nanopillar is reproducibly deposited onto the apex.
The nanopillar is then coated with a
conductive film and an insulating film and then milled in cross-section
to
expose the conductive film as a nanoelectrode.
This approach provides for reproducible probe and
electrode dimensions
due to templating by the nanopillar.
Additionally, this approach eliminates the need for
precise FIB milling,
as the nanopillar can be milled anywhere along its length to expose the
nanoelectrode.
Significance
This work has demonstrated an
approach for the simple
and reproducible fabrication of SECM-AFM probes with dimensions
approaching 100
nm, which represents a significant improvement over commonly reported
SECM-AFM
probes with dimensions of the order of 1 mm. Such probes provide a
route for high
resolution imaging of surface topography and electrochemical or
biological
activity. Such high
resolution imaging
has potential applications in areas including corrosion initiation and
biological membrane transport.
Future work will focus on further
decreasing the
dimensions of the fabricated probes.
This will focus on developing a better understanding of
the EBID process
to minimize the nanopillar dimensions and also minimizing the thickness
of the
insulating Al2O3 film.
Performers
D.
J. Comstock, M. C. Hersam (Northwestern U.); J.
M. Hiller (Argonne-MSD); J. W. Elam (Argonne-ES)

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