Alex Martinson

  Alex Martinson

  • Principal Investigator, Chemist
  • Bldg. 241, A-280
  • Phone: 630-252-7520
  • This e-mail address is being protected from spambots. You need JavaScript enabled to view it.


  • Ph.D. Physical Chemistry, Northwestern University - 2008
  • B.A., Chemistry and Mathematics, Luther College - 2003

Professional Experience

Research Interests

Alex Martinson is a Chemist at ANL in the Materials Science Division, Interfaces for Clean Energy ThemeSurface Chemistry Group. The aim of his research is to elucidate and exploit a multitude of technologically relevant surface chemistries and optoelectronic processes that occur at the interface between materials. The research tests the limits of what is possible in digital materials synthesis and device fabrication at length scales approaching the atomic level. Present work is intended to advance the science of solar energy conversion and catalysis through the design, modeling, and fabrication of photovoltaics (PV), solar fuels platforms, and single site catalytic frameworks. Disruptive designs are enabled through the precise spatial and chemical control afforded by atomic layer deposition (ALD). These studies explore the intersection of earth-abundant materials, photoelectrochemistry, and targeted materials synthesis in order to study their synergies and reveal the shortcomings of our control over energy and matter.

Selected Publications

  • Kim, I. S.; Martinson, A. B. F. “Stabilizing Hybrid Perovskites Against Moisture and Temperature via Non-Hydrolytic Atomic Layer Deposited Overlayers ” J. Mat. Chem. A2015 just accepted (
  • Harutyunyan, H.; Martinson, A. B. F.; Rosenmann, D.; Khorashad, L. K.; Besteiro, L.; Govorov, A.; Wiederrecht, G. “Anomalous generation of ultrafast hot plasmonic electrons in nanostructures with hot spot.” Nature Nanotech. 2015, 10, 770-774. (
  • Kim, I. S.; Borycz, J.; Platero-Prats, A. E.; Tussupbayev, S.; Wang, T. C.; Farha, O. K.; Hupp, J. T.; Gagliardi, L.; Chapman, K. W.; Cramer, C. J.; Martinson, A. B. F. “Targeted Single-Site MOF Node Modification: Trivalent Metal Loading via Atomic Layer Deposition” Chem. Mater. 2015, 27, 4772-4778. (
  • McCarthy, R. F.; Schaller, R. D.; Gosztola, D. J.; Wiederrecht, G. P.; Martinson, A. B. F. “Photoexcited Carrier Dynamics of In2SThin Films” J. Phys. Chem. Lett.2015, 6, 2554–2561. (
  • Dasgupta, N. P.; Meng, X.; Elam, J. W.; Martinson, A. B. F. "Atomic Layer Deposition of Metal Sulfide Materials" Acc. Chem. Rev., 2015, 48, 341-348. (

Full Publications

View publication list for this author.