Alex Martinson

  Alex Martinson

  • Principal Investigator, Assistant Chemist
  • Bldg. 200,D-169
  • Phone: 630-252-7520
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  • Ph.D. Physical Chemistry, Northwestern University - 2008
  • B.A., Chemistry and Mathematics, Luther College - 2003

Professional Experience

  • Assistant Chemist, Argonne National Laboratory - 2009-present
  • Director's Postdoctoral Fellow, Argonne National Laboratory - 2008-2009
  • Publications have received over 1600 citations with an h-index of 17 (see Google Scholar Page).
  • Author and inventor on 5 patents and pending applications.

Research Interests

Alex Martinson is an Assistant Chemist at ANL in the Materials Science Division, Surface Chemistry Group. The aim of his research is to elucidate and exploit a multitude of technologically relevant optoelectronic processes that occur at the interface between conductors, semiconductors, and ionic conductors. The research tests the limits of what is possible in materials synthesis and device fabrication at length scales approaching the atomic level. Present work is intended to advance the science of solar energy conversion through the design, modeling, and fabrication of nanoscale photovoltaic (PV) and solar fuels platforms. Disruptive designs are enabled through the precise spatial and chemical control afforded by atomic layer deposition. These studies explore the intersection of earth-abundant materials, photoelectrochemistry, and thin film PV in order to study their synergies and reveal the shortcomings of our control over energy and matter.

Selected Publications

  • Avila, J. R.; DeMarco, E. J.; Emery, J. D.; Farha, O. K.; Pellin, M. J.; Hupp, J. T.; Martinson, A. B. F. “Real-Time Observation of Atomic Layer Deposition Inhibition: Metal Oxide Growth on Self-Assembled Alkanethiols” ACS Appl. Mater. Interfaces, 2014 ASAP. (
  • Riha, S. C.; Jin, S.; Baryshev S. V.; Thimsen, E.; Wiedderecht, G. P.; Martinson, A. B. F.;   “Stabalizing Cu2S for Photovoltaics One Atomic Layer at a Time” ACS Appl. Mater. Interfaces, 2013, 5, 10302 - 10309. (
  • Klug, J. A.; Becker, N. G.; Riha, S. C.; Martinson, A. B. F.; Elam, J. W.; Pellin, M. J.; Proslier T. “Low Temperature Atomic Layer Deposition of Highly Photoactive Hematite Using Iron(III) Chloride and Water” J. Mater. Chem. A, 2013, 1, 11607-11613. (
  • Martinson, A. B. F.; Riha, S. C.; Thimsen, E.; Elam J. W.; Pellin, M. J.  “Structural, Optical, and Electronic Stability of Copper Sulfide Thin Films Grown by Atomic Layer Deposition” Energy Environ. Sci., 2013, 6, 1868 - 1878. (
  • Riha, S. C.; Klahr, B. M.; Tyo, E. C.; Seifert, S.; Vajda, S.; Pellin, M. J.; Hamann, T. W.; Martinson, A. B. F. “Atomic Layer Deposition of a Submonolayer Catalyst for the Enhanced Photoelectrochemical Performance of Water Oxidation with Hematite” ACS Nano, 2013, 7, 2396-2405. (

Full Publications

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