Alex Martinson

  Alex Martinson

  • Principal Investigator, Chemist
  • Bldg. 241, A-280
  • Phone: 630-252-7520
  • This e-mail address is being protected from spambots. You need JavaScript enabled to view it.
 

Education

  • Ph.D. Physical Chemistry, Northwestern University - 2008
  • B.A., Chemistry and Mathematics, Luther College - 2003

Professional Experience

Research Interests

Alex Martinson is a Chemist at ANL in the Materials Science Division, Surface Chemistry Group. The aim of his research is to elucidate and exploit a multitude of technologically relevant surface chemistries and optoelectronic processes that occur at the interface between materials. The research tests the limits of what is possible in digital materials synthesis and device fabrication at length scales approaching the atomic level. Present work is intended to advance the science of solar energy conversion and catalysis through the design, modeling, and fabrication of photovoltaics (PV), solar fuels platforms, and single site catalytic frameworks. Disruptive designs are enabled through the precise spatial and chemical control afforded by atomic layer deposition (ALD). These studies explore the intersection of earth-abundant materials, photoelectrochemistry, and targeted materials synthesis in order to study their synergies and reveal the shortcomings of our control over energy and matter.

Selected Publications

  • Dasgupta, N. P.; Meng, X.; Elam, J. W.; Martinson, A. B. F. "Atomic Layer Deposition of Metal Sulfide Materials" Acc. Chem. Rev., 2014, accepted.
  • Emery, J. D.; Schleputz, C. M.; Guo P.; Riha, S. C.; Chang, R. P. H.; Martinson, A. B. F. "Atomic Layer Deposition of Metastable β-Fe2O3 via Isomorphic Epitaxy for Photo-assisted Water Oxidation" ACS Appl. Mater. Interfaces, 2014, 6, 21894-21900. (http://dx.doi.org/10.1021/am507065y)
  • Riha, S. C.; Schaller, R.D; Gosztola, D. J.; Wiederrecht, G. P., Martinson, A. B. F. Photoexcited Carrier Dynamics of Cu2S Thin Films” J. Phys. Chem Lett.2014, 5, 4055-4061. (http://dx.doi.org/10.1021/jz5021873).
  • McCarthy, R. F.; Weimer, M. S.; Emery, J. D.; Hock, A. S.; Martinson, A. B. F. Oxygen-Free Atomic Layer Deposition of Indium Sulfide” ACS Appl. Mater. Interfaces2014 , 6, 12137-12145. (http://dx.doi.org/10.1021/am501331w)
  • Avila, J. R.; DeMarco, E. J.; Emery, J. D.; Farha, O. K.; Pellin, M. J.; Hupp, J. T.; Martinson, A. B. F. “Real-Time Observation of Atomic Layer Deposition Inhibition: Metal Oxide Growth on Self-Assembled Alkanethiols” ACS Appl. Mater. Interfaces2014, 6, 11891-11898. (http://dx.doi.org/10.1021/am503008j)

Full Publications

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